• 1982年 本公司成立於新竹市,主要營業項目為維修及販賣真空幫浦,與新竹科學園區內多家廠商配合。
• 1990年 轉型研發真空系統,以小型研究系統為主,主要供應各學術單位實驗使用。
• 1995年 開始研發小型量產設備,提供各晶元及光電廠研發用。
• 2002年 隨著台南科學工業園區的成立及客戶族群的熱烈迴響,遷移至台南縣永康市,提供南台灣客戶更方便的服務。
• 2005年 投入系統研發實驗室,目的為開發穩定的製程系統。
• 2007年 製程系統成功研發出多靶源共濺鍍系統。
• 2010年 投入小型的濺鍍鍍膜代工。
• 2012年 與韓國專業系統製造商S.I.T簽訂台灣總代理。
• 1982 The company was established in in Hsinchu City, the principal place of business projects for the repair and sale of vacuum pump work with multiple vendors in the Hsinchu Science Park.
• 1990 Transformation developed vacuum system small study mainly supply various academic institutions experimental use.
• 1995 Began the development of a small amount of production equipment, Epistar optical power plant developed with.
• 2002 With the establishment of the Tainan Science-Based Industrial Park, the company's business and then expand to Tainan Yongkang District, more convenient services to customers in southern Taiwan.
• 2005 For the development of a stable process system and thus put into the system stable process.
• 2007 Process system successfully developed a multi-target source sputtering system.
• 2010 Small investment sputter coating foundry
• 2012 With Korean professional system manufacturers S.I.T signed distributor in Taiwan
• 高真空蒸鍍系統 (電子槍、OLED、熱阻式)
• 磁控濺鍍系統 (DC Sputter、RF Sputter、CO Sputter、IN-Line Sputter)
• 電漿化學氣相沈積系統
• 離子乾式蝕刻系統
• 真空快速升溫爐
• 爐管製程系統
• 電子鎗
• 離子鎗
• 射頻電源供應器
• 直流電源供應器
• 氣體質量流量控制器
• 高真空幫浦 (Diffusion、Cryo、Turbo)
• 低真空幫浦 (Dry、Roots、Scroll、Rotary)
• 真空零組件
• High-vacuum vapor deposition system (electron gun, an OLED, thermal resistive)
• Magnetron sputtering system (DC Sputter, RF Sputter, CO Sputter, IN-Line Sputter)
• Plasma chemical vapor deposition system
• Plasma dry etching system
• Vacuum rapid heating furnace
• Furnace processing system
• Electron gun Ion gun
• RF power supply
• DC Power Supply
• Gas mass flow controller
• High vacuum pump (Diffusion, Cryo, Turbo)
• The Low vacuum pump (Dry, Roots, Scroll, Rotary)
• Vacuum components